$19.62 Price include GST
Weight: 600 g
Post Care Cooling Sheet Mask is a soothing face mask designed for tired and irritated skin. It provides a cooling sensation, quickly calming and soothing the skin, especially after treatments like laser procedures. This mask from Histolab is one of the most effective ways to reduce irritation and restore comfort to your skin.
Capacity: 5 pcs
Skin Type: Suitable for all skin types, including oily, dry, normal, combination, and sensitive skin.
After toner, carefully place the mask over the face and leave for about 10~20 minutes. Then, remove it and tap your face gently.
Water, Xanthan Gum, Trehalose, Sodium Hyaluronate, Sodium Benzoate, sh-Polypeptide-4, sh-Polypeptide-16, sh-Polypeptide-1, sh-Oligopeptide-1, Potassium Sorbate, PORTULACA OLERACEA EXTRACT, Polysorbate 20, Phenoxyethanol, PEG-75, PEG-60 Hydrogenated Castor Oil, PEG/PPG-17/ 6Copolymer, Panthenol, Nicotinoyl Hexapeptide-44, Niacinamide, Mentha Piperita (Peppermint) Oil, Lecithin, Hamamelis Virginiana (Witch Hazel) Extract, Glycerin, Ethylhexylglycerin, Disodium EDTA, Citric Acid, Caprylhydroxamic Acid, Butylene Glycol, Boswellia Serrata Resin Extract, Arginine, Aloe Barbadensis Leaf Juice, Alcohol Denat., Adenosine, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, 1,2-Hexanediol, Camellia Sinensis Leaf Extract.
Histolab, a medical skincare brand distributed solely to dermatological clinics, has been devoting itself to accomplish an immediate skin improvement by taking advantage of its own development of Plant Stem Cell(Callus) and of our renowned mentoring group of doctor’s advice for achieving the most effective prescription.
Currently, Histolab products are loved by almost 8,500 dermatological and aesthetic clinics in Korea. Thanks to its wide variety of product ranges, Histolab products have become famous for having excellent efficiencies in the field of professional peeling, acne treatment, and post-laser skin treatment as well as basic care like wrinkle improvement freckles, skin rejuvenation, and whitening., etc.





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